示例2
Example 2
第一屆智能光學(xué)設(shè)計(jì)大賽
The 1st Intelligent Optical Design Competition
應(yīng)用場(chǎng)景描述
Application Scenarios Description
大賽申報(bào)主題：用于微結(jié)構(gòu)晶片檢測(cè)的光學(xué)系統(tǒng)
Theme: Optical System for Investigation of Micro-Structured Wafer
申報(bào)人姓名（如多人，請(qǐng)寫多個(gè)名字）：王欣
Name (If there are multiple people, please write multiple names): Wang Xin
申報(bào)單位：訊技光電科技（上海）有限公司
Units: INFOTEK SHANGHAI
應(yīng)用領(lǐng)域（教育領(lǐng)域 / 科研領(lǐng)域 / 工業(yè)領(lǐng)域）: 工業(yè)領(lǐng)域
Applications(Education/R&D/Industry)：Industry
應(yīng)用場(chǎng)景描述：
Application Scenarios Description：
用于微結(jié)構(gòu)晶片檢測(cè)的光學(xué)系統(tǒng)
摘要
在半導(dǎo)體工業(yè)中，晶片檢測(cè)系統(tǒng)被用來(lái)檢測(cè)晶片上的缺陷并找到它們的位置。為了確保微結(jié)構(gòu)所需的圖像分辨率，檢測(cè)系統(tǒng)通常使用高NA物鏡，并且工作在UV波長(zhǎng)范圍內(nèi)。作為例子，我們建立了包括高NA聚焦和光與微結(jié)構(gòu)相互作用的完整晶片檢測(cè)系統(tǒng)的模型，并演示了成像過(guò)程。
 系統(tǒng)描述
Optical System for Investigation of Micro-Structured Wafer
Abstract
In the semiconductor industry, wafer inspection systems are used to detect defects on a wafer and find their positions. To ensure the necessary image resolution for the microstructures, the inspection system often employs a high-NA objective and works in the UV wavelength range. As an example, a complete wafer inspection system including high-NA focusing and light interaction with microstructures is modeled, and the formation of the image is demonstrated.
System Demonstrate
填寫完成后，請(qǐng)將此文件與簽字版大賽承諾書一并發(fā)送郵件至 [email protected] ，郵件標(biāo)題與本文件標(biāo)題請(qǐng)保持一致。
After completing the filling, please send this document along with the signed version of the competition commitment via email to [email protected], Please keep the email title consistent with this file title.
應(yīng)用場(chǎng)景描述撰寫注意事項(xiàng)：
Notes on writing application scenario description:
1. 我們歡迎任意類型光學(xué)系統(tǒng)的投稿，不僅僅局限于該示例。
We welcome any type of optical system, not limited to this examples !
2. 請(qǐng)使用150-250字清晰簡(jiǎn)潔地描述您的場(chǎng)景，并用通過(guò)示意圖來(lái)展示場(chǎng)景的建模和設(shè)計(jì)思路。
Please use 150-250 words for a clear and concise description of your scene and an illustration to demonstrate the modeling and design of the scenario.
3. 在您的場(chǎng)景描述或演示中，您需要清楚地描述光源是什么，元件是什么，要測(cè)量什么物理量，或者要達(dá)到什么目的。
In your scene description or demonstrate, you need to clearly describe what the light source is, what the component is, what the physical quantity is to be measured, or what the purpose is to be achieved.
4. 您的應(yīng)用場(chǎng)景，需要提交中英文雙語(yǔ)版本。
Your application scenario requires submission of bilingual versions in both Chinese and English.
您僅需提交以上信息即可，以下鏈接為該示例的完整描述，請(qǐng)您參考。
You only need to submit the content of the above information. The following link provides a complete description of the case for your reference:
用于微結(jié)構(gòu)晶片檢測(cè)的光學(xué)系統(tǒng) - 訊技光電科技(上海)有限公司 (infotek.com.cn) |
